India’s first Chemical Mechanical Polishing Pad Technologies hub has been inaugurated at T-Works in Hyderabad. Established with Japan’s Toho Koki Seisakusho Company Limited, the centre will support semiconductor research, training and domestic manufacturing of CMP pads within the next 18 to 24 months
Published Date – 11 July 2026, 07:29 PM
Hyderabad: India’s first hub dedicated to Chemical Mechanical Polishing (CMP) Pad Technologies, a critical component in semiconductor chip manufacturing, has been established at T-Works in Hyderabad.
The centre, set up at T-Works in collaboration with Japan-based Toho Koki Seisakusho Company Limited, was formally inaugurated by IT Minister D Sridhar Babu here on Saturday.
CMP pads, which are used to planarise wafers during semiconductor chip manufacturing, are currently imported entirely from overseas. With the establishment of this hub, CMP pad technology, which until now has been available only abroad, has been introduced in India for the first time, with Hyderabad serving as the platform.
Speaking on the occasion, the Minister said the centre would provide training and technical support for research to students, researchers, innovators, startups and industries.
Joint research initiatives would be undertaken in partnership with leading educational institutions, research organisations, industries and MSMEs, with the aim of manufacturing CMP pads domestically within the next 18 to 24 months, he added.
